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您所在的位置:中国视觉网 >> 新闻 >> 半导体 >> Aviza技术在日本得到采用 ALD系统将被用于45奈米逻辑集成电路生产  
Aviza技术在日本得到采用 ALD系统将被用于45奈米逻辑集成电路生产
作者:佚名 文章来源中国半导体制造业的技术权威网站 点击数:   更新时间:2008-7-24

Aviza Technology, Inc. , a supplier of advanced semiconductor capital equipment and process technologies for the global semiconductor industry and related markets, today announced that it has received an order for its Celsior fxP single wafer atomic layer deposition (ALD) system from a leading advanced logic integrated circuit (IC) manufacturer in Japan. The Celsior fxP system will be fitted with multiple chambers that will be used for high-k and metal gate (HKMG) deposition.


        Aviza’s Celsior fxP system was selected over other competing technologies because of its ability to consistently deliver superior device performance on sub-45nm logic devices. In addition, the HKMG stack deposited on the Celsior fxP demonstrated very low leakage currents at reduced effective oxide thickness (EOT) and stable values of effective work function. These parameters are critical for manufacturing of both logic and flash devices at sub-45nm nodes. The process chambers have been designed to demonstrate extendibility to the sub-32nm nodes.


        “This Celsior fxP system order signifies Aviza’s continued market penetration and adoption of our ALD Logic applications,” said Dr. Masaaki Yashiro, President of Aviza Technology Japan K.K. “The system was selected on the key merits of delivering improved device performance via accurate film composition control and process repeatability for HKMG stacks used for advanced Logic ICs. We look forward to supporting our customer’s manufacturing and development needs.”


        Note to editors: Aviza will be exhibiting at this year's SEMICON West exhibition, to be held from Tuesday, July 15 through Thursday, July 17, 2008. For more information about Aviza and the Company's process technology and product offerings, please visit the company at Booth #1521 in the South Hall of Moscone Convention Center in San Francisco, Calif.

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